Enlitech at ASEAN Failure Analysis Workshop (EDFA 2026) | Date: July 17, 2026 | Venue: National University of Singapore (NUS)

．Technical Sharing

Spectral Imaging–Based Optical Loss Mapping for Efficient Failure Analysis and Wafer-Level Inspection of Silicon Photonic Integrated Circuits

．Presenter: Dr. Joseph Liao

As silicon photonics continues to advance toward high-speed optical interconnects, data center applications, and Co-Packaged Optics (CPO) architectures, rapidly identifying optical defects and improving manufacturing yield have become critical challenges for the semiconductor industry.

At EDFA Workshop 2026, Enlitech will share an innovative spectral imaging technology that directly visualizes optical propagation behavior inside silicon photonic integrated circuits (PICs), enabling optical loss mapping, efficient defect localization, and wafer-level inspection for advanced photonic devices.

Join Dr. Joseph Liao at EDFA Workshop 2026 to explore how spectral imaging is enhancing failure analysis capabilities for next-generation silicon photonics and accelerating reliability improvement in advanced semiconductor manufacturing.